The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2019
Filed:
Feb. 09, 2018
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
Steven Bilodeau, Oxford, CT (US);
Emanuel I. Cooper, Scarsdale, NY (US);
Jaeseok Lee, Gyeonggi-do, KR;
WonLae Kim, Gyeonggi-do, KR;
Jeffrey A. Barnes, Danielsville, PA (US);
Assignee:
Entegris, Inc., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); G03F 7/42 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31133 (2013.01); G03F 7/423 (2013.01); H01L 21/02057 (2013.01); H01L 21/0273 (2013.01);
Abstract
A method and composition for removing bulk and/or ion-implanted resist material from microelectronic devices have been developed. The compositions effectively remove the ion-implanted resist material while not damaging the silicon-containing or germanium-containing materials.