The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2019

Filed:

Feb. 26, 2018
Applicant:

Rohm Co., Ltd., Kyoto, JP;

Inventors:

Shinya Takado, Kyoto, JP;

Minoru Akutsu, Kyoto, JP;

Taketoshi Tanaka, Kyoto, JP;

Norikazu Ito, Kyoto, JP;

Assignee:

ROHM CO., LTD., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/20 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/778 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66462 (2013.01); H01L 29/7786 (2013.01); H01L 29/2003 (2013.01); H01L 29/4236 (2013.01); H01L 29/42364 (2013.01); H01L 29/517 (2013.01);
Abstract

A nitride semiconductor device includes: an electron transit layer including GaInN (0<x≤1); an electron supply layer formed on the electron transit layer and including AlInN (0<y≤1); a gate insulating film formed to pass through the electron supply layer to contact the electron transit layer; and a gate electrode facing the electron transit layer with the gate insulating film interposed therebetween, wherein, in the electron transit layer, a portion contacting the gate insulating film and a portion contacting the electron transit layer are flush with each other.


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