The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Dec. 20, 2017
Tokyo Electron Limited, Tokyo, JP;
Tetsuo Fukuoka, Koshi, JP;
Masashi Itonaga, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
An abnormal processing can be appropriately detected in a processing of supplying a preset gas to a substrate as a processing target. A hydrophobizing unit Uincludes a processing vesselconfigured to accommodate therein a wafer W as a processing target; an opening/closing unit(first supply unit) configured to supply air (first gas) into the processing vessel; a gas supply unit(second supply unit) configured to supply a HMDS gas (second gas), having a relative humidity different from that of the air, into the processing vessel; and a controller(control unit). The controlleris configured to determine a state of a gas within the processing vesselbased on a relative humidity obtained after a supply of the air by the opening/closing unitand a supply of the HMDS gas by the gas supply unitare performed.