The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Jul. 31, 2015
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Kana Okada, Kanagawa, JP;
Takashi Makinoshima, Kanagawa, JP;
Masatoshi Echigo, Kanagawa, JP;
Go Higashihara, Okayama, JP;
Atsushi Okoshi, Okayama, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); H01L 21/02 (2006.01); H01L 21/31 (2006.01); H01L 21/30 (2006.01); C07C 261/02 (2006.01); C09D 7/20 (2018.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); C09D 179/04 (2006.01); G03F 7/38 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07C 261/02 (2013.01); C09D 7/20 (2018.01); C09D 179/04 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2037 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); H01L 21/027 (2013.01); H01L 21/0274 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31116 (2013.01); H01L 21/31144 (2013.01); G03F 7/0397 (2013.01);
Abstract
The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).