The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Dec. 05, 2017
Nanchang Hangkong University, Nanchang, CN;
Tsinghua University, Beijing, CN;
Songling Huang, Beijing, CN;
Kai Song, Nanchang, CN;
Wei Zhao, Beijing, CN;
Chao Lu, Nanchang, CN;
Yu Zhang, Beijing, CN;
Shen Wang, Beijing, CN;
Jiarui Dong, Beijing, CN;
Zhe Wang, Beijing, CN;
NANCHANG HANGKONG UNIVERSITY, Nanchang, CN;
TSINGHUA UNIVERSITY, Beijing, CN;
Abstract
An imaging method based on guided wave scattering of omni-directional EMATs includes: selecting an nomni-directional EMAT from N omni-directional EMATs uniformly arranged in a detection region of a metal plate to be detected as an excitation EMAT; selecting m omni-directional EMATs as omni-directionally receiving EMATs to omni-directionally receive an ultrasonic guided wave signal, and calculating a travel time and intensity of the ultrasonic guided wave signal; judging whether the excitation EMAT and the omni-directionally receiving EMATs form a scattering group, if yes, calculating a position of a scattering point; judging whether the position of the scattering point is within a preset scattering region, if yes, determining the position of the scattering point as an effective scattering point; repeating the above steps until all N omni-directional EMATs have excited omni-directional ultrasonic guided waves, and performing curve fitting on all effective scattering points to obtain a defect profile image.