The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10336976 B1

Date of Patent:

Jul. 02, 2019

Filed:

Apr. 10, 2015

Photosensitive resin composition for forming cell culture substrate

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventor:

Takahiro Senzaki, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe, Martens, Olson & Bear LLP

Primary Examiner:

John A McPherson

Int. Cl.

CPC ...

G03F 7/031 (2006.01); G03F 7/028 (2006.01); C12M 3/00 (2006.01); C12M 1/00 (2006.01); B29C 41/12 (2006.01); C08F 2/46 (2006.01); C08J 7/00 (2006.01); B29C 35/00 (2006.01); B29C 35/08 (2006.01); B29C 41/00 (2006.01); B29C 41/42 (2006.01); B29C 71/00 (2006.01); B29C 71/04 (2006.01); B29D 7/00 (2006.01); B29K 33/04 (2006.01); B29K 67/00 (2006.01); B29K 71/00 (2006.01); B29L 7/00 (2006.01);

U.S. Cl.

CPC ...

C12M 23/20 (2013.01); B29C 35/002 (2013.01); B29C 35/0805 (2013.01); B29C 41/003 (2013.01); B29C 41/12 (2013.01); B29C 41/42 (2013.01); B29C 71/0009 (2013.01); B29C 71/04 (2013.01); B29D 7/00 (2013.01); C08F 2/46 (2013.01); C08J 7/00 (2013.01); G03F 7/028 (2013.01); G03F 7/031 (2013.01); B29C 2035/0827 (2013.01); B29C 2071/0045 (2013.01); B29K 2033/04 (2013.01); B29K 2067/06 (2013.01); B29K 2071/00 (2013.01); B29L 2007/00 (2013.01);

Abstract

A photosensitive resin composition for cell culture substrates that enables the low-cost manufacture of a cell culture substrate, that can easily form patterns of various shapes when providing a pattern on the surface of a cell culture substrate, has low cytotoxicity, and that can form a cell culture substrate; a cell culture substrate that is formed using the photosensitive resin composition; and a cell culture substrate manufacturing method that uses the photosensitive resin composition. The photosensitive resin composition includes a photopolymerizable monomer and a photopolymerization initiator. The photopolymerizable monomer contains a defined amount of a polyfunctional monomer that is at least trifunctional, and the content of the photopolymerization initiator is within a prescribed range.

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