The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Dec. 22, 2015
Applicant:
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Inventors:
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); B81C 99/00 (2010.01); G02B 3/00 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01); B81C 1/00 (2006.01); C23C 14/04 (2006.01); C23C 14/48 (2006.01); C23C 14/58 (2006.01); G02B 3/02 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B29D 11/00365 (2013.01); B81C 1/0046 (2013.01); B81C 1/00103 (2013.01); B81C 99/009 (2013.01); C23C 14/042 (2013.01); C23C 14/48 (2013.01); C23C 14/5853 (2013.01); C23C 14/5873 (2013.01); G02B 3/0025 (2013.01); G02B 3/0031 (2013.01); G02B 3/02 (2013.01); G03F 7/0002 (2013.01); H01L 21/308 (2013.01); H01L 21/3065 (2013.01); H01L 21/31111 (2013.01); H01L 21/31116 (2013.01); H01L 21/76804 (2013.01); H01L 21/76817 (2013.01); B81B 2203/0376 (2013.01); B81C 2201/0133 (2013.01); B81C 2201/0136 (2013.01);
Abstract
The invention relates in particular to a method for creating patterns in a layer () to be etched, starting from a stack comprising at least the layer () to be etched and a masking, layer () on top of the layer () to be etched, the masking layer () having at least one pattern (), the method comprising at least: