The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2019

Filed:

Apr. 07, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Byung-jin Choi, Austin, TX (US);

Anshuman Cherala, Austin, TX (US);

Zhengmao Ye, Austin, TX (US);

Xiaoming Lu, Cedar Park, TX (US);

Kang Luo, Austin, TX (US);

Nobuto Kawahara, Utsunomiya, JP;

Yoshikazu Miyajima, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); G03F 7/00 (2006.01); B29C 43/02 (2006.01); B29C 43/32 (2006.01); B29C 43/58 (2006.01); B29C 43/36 (2006.01);
U.S. Cl.
CPC ...
B29C 43/58 (2013.01); B29C 43/021 (2013.01); G03F 7/0002 (2013.01); H01L 21/6838 (2013.01); B29C 2043/025 (2013.01); B29C 2043/3222 (2013.01); B29C 2043/3652 (2013.01); B29C 2043/5866 (2013.01);
Abstract

Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.


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