The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2019
Filed:
Apr. 10, 2014
Eyenetra, Inc., Somerville, MA (US);
Vitor Pamplona, Somerville, MA (US);
Ramesh Raskar, Cambridge, MA (US);
EYENETRA, INC., Cambridge, MA (US);
Abstract
In exemplary implementations of this invention, an aberrometer is used to measure the refractive condition of any eye. An artificial light source emits light that travels to a light sensor. Along the way, the light enters and then exits the eye, passes through or is reflected from one or more spatial light modulators (SLMs), and passes through an objective lens-system. The SLMs modify a bokeh effect of the imaging system (which is only visible when the system is out-of-focus), creating a blurred version of the SLM patterns. The light sensor then captures one or more out-of-focus images. If there are refractive aberrations in the eye, these aberrations cause the SLM patterns captured in the images to be distorted. By analyzing differences between the distorted captured patterns and the undistorted SLM patterns, refractive aberrations of the eye can be computed and an eyewear measurement generated.