The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

Jan. 22, 2018
Applicants:

Sanken Electric Co., Ltd., Niiza-Shi, Saitama, JP;

Polar Semiconductor, Llc., Bloomington, MN (US);

Inventor:

Taro Kondo, Niiza, JP;

Assignees:

SANKEN ELECTRIC CO., LTD., Niiza-shi, JP;

Polar Semiconductor, LLC., Bloomington, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7813 (2013.01); H01L 29/1095 (2013.01); H01L 29/407 (2013.01); H01L 29/4236 (2013.01); H01L 29/42364 (2013.01); H01L 29/42376 (2013.01);
Abstract

A semiconductor device according to one or more embodiments may include: a drain region; a drift region positioned above the drain region; a base region positioned on the drift region; a trench positioned to abut the base region and the drift region; an insulating in the trench; a counter electrode embedded in the insulating film; a gate electrode positioned above the counter electrode and that is embedded in the insulating film; and a source region that abuts the base region and the trench, wherein a thickness of the insulating film between the gate electrode and an interface between the drift region and the base region is larger than a thickness of the insulating film between the gate electrode and an interface between the source region and the base region.


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