The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

Oct. 22, 2018
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Rohit Galatage, Clifton Park, NY (US);

Steven Bentley, Menands, NY (US);

Puneet Harischandra Suvarna, Menands, NY (US);

Zoran Krivokapic, Santa Clara, CA (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 21/28 (2006.01); H01L 29/78 (2006.01); H01L 29/788 (2006.01);
U.S. Cl.
CPC ...
H01L 29/42324 (2013.01); H01L 21/28273 (2013.01); H01L 21/28291 (2013.01); H01L 29/6653 (2013.01); H01L 29/6684 (2013.01); H01L 29/66825 (2013.01); H01L 29/788 (2013.01); H01L 29/78391 (2014.09); H01L 29/66545 (2013.01); H01L 29/66795 (2013.01); H01L 29/7851 (2013.01);
Abstract

A semiconductor device includes a gate electrode structure that is positioned adjacent to a channel region of a transistor element. The gate electrode structure includes a floating gate electrode portion, a negative capacitor portion, and a ferroelectric material capacitively coupling the floating gate electrode portion to the negative capacitor portion. A first conductive material is positioned between the floating gate electrode portion and the ferroelectric material, wherein a first portion of the first conductive material is embedded in and laterally surrounded by the floating gate electrode portion, and a second conductive material is positioned between the first portion of the first conductive material and the ferroelectric material, wherein the second conductive material is embedded in and laterally surrounded by a second portion of the first conductive material.


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