The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

Jun. 02, 2017
Applicant:

Iqe, Plc, St. Mellons, Cardiff, GB;

Inventors:

Andrew Clark, Mountain View, CA (US);

Rytis Dargis, Oak Ridge, NC (US);

Michael Lebby, San Francisco, CA (US);

Rodney Pelzel, Emmaus, PA (US);

Assignee:

IQE plc, St. Mellons, Cardiff, GB;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/20 (2006.01); H01S 3/16 (2006.01); H01S 3/09 (2006.01); H01S 5/30 (2006.01); H01L 23/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 24/32 (2013.01); H01L 21/0251 (2013.01); H01L 21/02381 (2013.01); H01L 21/02439 (2013.01); H01L 21/02483 (2013.01); H01L 21/02502 (2013.01); H01L 21/02505 (2013.01); H01L 21/02543 (2013.01); H01L 21/02546 (2013.01); H01L 24/94 (2013.01); H01S 3/09 (2013.01); H01S 3/1603 (2013.01); H01S 3/1605 (2013.01); H01S 3/1611 (2013.01); H01S 3/1628 (2013.01); H01S 3/1655 (2013.01); H01S 5/3031 (2013.01); H01L 21/0262 (2013.01); H01L 2224/291 (2013.01); H01L 2224/29082 (2013.01); H01L 2224/29193 (2013.01); H01L 2224/32145 (2013.01); H01L 2924/01033 (2013.01); H01L 2924/01064 (2013.01); H01L 2924/01068 (2013.01); H01L 2924/0505 (2013.01); H01L 2924/0525 (2013.01); H01L 2924/0545 (2013.01); H01L 2924/10253 (2013.01); H01L 2924/10335 (2013.01); H01S 5/30 (2013.01); H01S 2301/17 (2013.01);
Abstract

Systems and methods described herein may include a first semiconductor layer with a first lattice constant, a rare earth pnictide buffer epitaxially grown over the first semiconductor, wherein a first region of the rare earth pnictide buffer adjacent to the first semiconductor has a net strain that is less than 1%, a second semiconductor layer epitaxially grown over the rare earth pnictide buffer, wherein a second region of the rare earth pnictide buffer adjacent to the second semiconductor has a net strain that is a desired strain, and wherein the rare earth pnictide buffer may comprise one or more rare earth elements and one or more Group V elements. In some examples, the desired strain is approximately zero.


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