The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
May. 22, 2017
Applicant:
Sciocs Company Limited, Ibaraki, JP;
Inventors:
Masahiro Hayashi, Kanagawa, JP;
Chiharu Kimura, Miyagi, JP;
Assignee:
SCIOCS COMPANY LIMITED, Ibaraki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01); C30B 29/38 (2006.01); C30B 29/64 (2006.01); H01L 33/00 (2010.01); H01L 33/16 (2010.01);
U.S. Cl.
CPC ...
H01L 21/67309 (2013.01); H01L 21/67011 (2013.01); H01L 21/67242 (2013.01); H01L 21/67353 (2013.01); H01L 21/6835 (2013.01); H01L 21/6836 (2013.01); H01L 21/68735 (2013.01); C30B 29/38 (2013.01); C30B 29/64 (2013.01); H01L 33/0095 (2013.01); H01L 33/16 (2013.01); H01L 2221/68327 (2013.01);
Abstract
A method for producing a crystal substrate includes preparing, measuring, holding, and machining. The preparing prepares a crystal substrate body including a curved crystal lattice plane. The measuring measures a shape feature of the crystal lattice plane. The holding holds the crystal substrate body in a warped state in accordance with the shape feature measured by the measuring, to more flatten the crystal lattice plane than the crystal lattice plane at the preparing. The machining machines a surface of the crystal substrate body held in the warped state, to flatten the surface.