The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Mar. 25, 2014
Shibaura Mechatronics Corporation, Yokohama-shi, JP;
Konosuke Hayashi, Yokohama, JP;
Takashi Ootagaki, Yokohama, JP;
Yuji Nagashima, Yokohama, JP;
Akinori Iso, Yokohama, JP;
SHIBAURA MECHATRONICS CORPORATION, Yokohama-shi, JP;
Abstract
According to one embodiment, a substrate processing apparatus () includes: a support () configured to support a substrate (W) in a plane; a rotation mechanism () configured to rotate the support () about an axis that crosses a surface of the substrate (W) supported by the support () as a rotation axis; a plurality of nozzles (), which are aligned from the center toward the periphery of the substrate (W) supported by the support (), configured to eject a treatment liquid to the surface of the substrate (W) on the support () being rotated by the rotation mechanism (), and a controller () configured to control the nozzles to eject the treatment liquid at different ejection timings according to the thickness of a film of the treatment liquid formed on the surface of the substrate (W) on the support () being rotated by the rotation mechanism ().