The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Jan. 08, 2018
Nuflare Technology, Inc., Yokohama-shi, JP;
Seiji Wake, Numazu, JP;
NUFLARE TECHNOLOGY, INC., Yokohama-shi, JP;
Abstract
In one embodiment, a charged particle beam lithography apparatus includes an irradiatorto irradiate substrates with charged particle beams, each of the substrates being provided with a predetermined mark, and a detectorto detect charged particles emitted when the predetermined mark is scanned by a charged particle beam and output a detection signal. The apparatus further includes an amplifierto adjust and amplify the detection signal and output an amplified signal, and a measurement circuitryto measure a location of the predetermined mark based on the amplified signal. The apparatus further includes storageto store initial gain values of the amplifier for amplifying the detection signal, the initial gain values corresponding to conditions of the scan. The amplifier amplifies the detection signal based on an initial gain value selected from the initial gain values according to a condition of the scan.