The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2019
Filed:
Jun. 04, 2015
Asml Netherlands B.v., Veldhoven, NL;
Gerben Pieterse, Eindhoven, NL;
Theodorus Wilhelmus Polet, Geldrop, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Willem Jan Bouman, Moergestel, NL;
Theodorus Marinus Modderman, Nuenen, NL;
Cornelius Maria Rops, Waalre, NL;
Bart Smeets, Bilzen, BE;
Koen Steffens, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.