The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
May. 02, 2014
Applicant:
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Inventors:
Yuko Sasaki, Tokyo, JP;
Hiroyuki Ito, Tokyo, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/147 (2006.01); H01J 37/141 (2006.01); H01J 37/12 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/12 (2013.01); H01J 37/141 (2013.01); H01J 37/147 (2013.01); H01J 2237/103 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/1534 (2013.01);
Abstract
Provided is a multifunctional charged particle beam device capable of inclining a beam with little aberration. The aberration is corrected by forming a local divergent field with a multipole, parallel current lines, or the like, matching the beam axis with the local divergent field via a conventional rotationally symmetric lens, deflector or astigmatism corrector, and counteracting an aberration occurring from another rotationally symmetric convex lens field.