The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Dec. 15, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jolanda Theodora Josephina Schmetz-Schagen, Son en Breugel, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Armand Eugene Albert Koolen, Nuth, NL;
Bastiaan Onne Fagginger Auer, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/20 (2006.01); G01N 21/956 (2006.01); G01B 11/02 (2006.01); G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70641 (2013.01); G01B 11/028 (2013.01); G01M 11/0264 (2013.01); G01N 21/956 (2013.01); G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 9/7026 (2013.01);
Abstract
A method for monitoring a characteristic of illumination from a metrology apparatus includes using the metrology apparatus to acquire a pupil image at different focus settings of the metrology apparatus and calculating an asymmetry value for each acquired pupil image, where each pupil image is acquired on at least one edge of a target of a substrate.