The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Oct. 04, 2016
Applicant:

Omnivision Technologies, Inc., Santa Clara, CA (US);

Inventors:

Gang Chen, San Jose, CA (US);

Duli Mao, Sunnyvale, CA (US);

Vincent Venezia, Los Gatos, CA (US);

Dyson H. Tai, San Jose, CA (US);

Bowei Zhang, Fremont, CA (US);

Assignee:

OmniVision Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/0352 (2006.01); H01L 31/02 (2006.01); H01L 31/107 (2006.01); H01L 31/0224 (2006.01); H01L 27/144 (2006.01);
U.S. Cl.
CPC ...
H01L 31/035272 (2013.01); H01L 27/1443 (2013.01); H01L 31/02027 (2013.01); H01L 31/022408 (2013.01); H01L 31/107 (2013.01);
Abstract

An avalanche photodiode has a first diffused region of a first diffusion type overlying at least in part a second diffused region of a second diffusion type; and a first minority carrier sink region disposed within the first diffused region, the first minority carrier sink region of the second diffusion type and electrically connected to the first diffused region. In particular embodiments, the first diffusion type is N-type and the second diffusion type is P-type, and the device is biased so that a depletion zone having avalanche multiplication exists between the first and second diffused regions.


Find Patent Forward Citations

Loading…