The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
May. 08, 2015
Applicant:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Inventors:
Takashi Makinoshima, Kanagawa, JP;
Masatoshi Echigo, Kanagawa, JP;
Assignee:
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C08G 8/12 (2006.01); C08G 8/14 (2006.01); C08G 8/18 (2006.01); C08G 10/02 (2006.01); C08G 12/02 (2006.01); G03F 7/039 (2006.01); C08G 18/02 (2006.01); C08G 8/24 (2006.01); C08G 8/16 (2006.01); G03F 7/11 (2006.01); G03F 7/26 (2006.01); H01L 21/027 (2006.01); C07C 25/22 (2006.01); C07C 39/12 (2006.01); C07C 43/285 (2006.01); C07C 69/52 (2006.01); C07C 69/533 (2006.01); C07C 205/06 (2006.01); C07C 211/61 (2006.01); C07C 321/26 (2006.01); C07D 303/18 (2006.01); C07D 303/36 (2006.01); C08G 8/08 (2006.01); C09D 161/06 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); H01L 21/306 (2006.01); H01L 21/308 (2006.01); G03C 1/815 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 25/22 (2013.01); C07C 39/12 (2013.01); C07C 43/285 (2013.01); C07C 69/52 (2013.01); C07C 69/533 (2013.01); C07C 205/06 (2013.01); C07C 211/61 (2013.01); C07C 321/26 (2013.01); C07D 303/18 (2013.01); C07D 303/36 (2013.01); C08G 8/08 (2013.01); C08G 8/12 (2013.01); C08G 8/14 (2013.01); C08G 8/16 (2013.01); C08G 8/18 (2013.01); C08G 8/24 (2013.01); C08G 10/02 (2013.01); C08G 12/02 (2013.01); C08G 18/02 (2013.01); C09D 161/06 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2037 (2013.01); G03F 7/26 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); H01L 21/027 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/30604 (2013.01); C07C 2603/54 (2017.05); G03C 1/8155 (2013.01);
Abstract
The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): wherein, each Rindependently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.