The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Jun. 29, 2018
Intel Corporation, Santa Clara, CA (US);
Anders Grunnet-Jepsen, San Jose, CA (US);
John Sweetser, Sunnyvale, CA (US);
Akihiro Takagi, San Mateo, CA (US);
Paul Winer, Santa Clara, CA (US);
John Woodfill, Palo Alto, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A light pattern projector with a pattern mask to spatially modulate an intensity of a wideband illumination source, such as an LED, and a projector lens to reimage the spatially modulated emission onto regions of a scene that is to be captured with an image sensor. The projector lens may comprise a microlens array (MLA) including a first lenslet to reimage the spatially modulated emission onto a first portion of a scene, and a second lenslet to reimage the spatially modulated emission onto a first portion of a scene. The MLA may have a fly's eye architecture with convex curvature over a diameter of the projector lens in addition to the lenslet curvature. The pattern mask may be an amplitude mask comprising a mask pattern of high and low amplitude transmittance regions. In the alternative, the pattern mask may be a phase mask, such as a refractive or diffractive mask.