The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2019

Filed:

Feb. 20, 2015
Applicant:

Massachusetts Institute of Technology, Cambridge, MA (US);

Inventors:

Fei Chen, Cambridge, MA (US);

Paul Warren Tillberg, Cambridge, MA (US);

Edward Stuart Boyden, Chestnut Hill, MA (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 1/36 (2006.01); C12Q 1/68 (2006.01); G01N 1/30 (2006.01); G02B 21/00 (2006.01); C12Q 1/6841 (2018.01);
U.S. Cl.
CPC ...
G01N 1/36 (2013.01); C12Q 1/6841 (2013.01); G01N 1/30 (2013.01); G02B 21/0072 (2013.01); G01N 2001/364 (2013.01);
Abstract

The present invention relates to an enlarged sample of interest for microscopy and methods for enlarging a sample of interest and the optical imaging of a sample of interest with resolution better than the classical microscopy diffraction limit, by synthesizing a swellable polymer network within a sample, it can be physically expanded, resulting in physical magnification.


Find Patent Forward Citations

Chen, Fei. (2019). Expansion microscopy (U.S. Patent No. 10309879). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10309879

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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