The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2019

Filed:

Jun. 06, 2018
Applicant:

Gigaphoton Inc., Tochigi, JP;

Inventors:

Yuichi Nishimura, Oyama, JP;

Takayuki Yabu, Oyama, JP;

Yoshifumi Ueno, Oyama, JP;

Assignee:

Gigaphoton Inc., Tochigi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70033 (2013.01); H05G 2/005 (2013.01); H05G 2/008 (2013.01);
Abstract

An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.


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