The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2019
Filed:
Oct. 25, 2016
Intel Corporation, Santa Clara, CA (US);
Basel Salahieh, Santa Clara, CA (US);
Ginni Grover, Santa Clara, CA (US);
Gowri Somanath, Santa Clara, CA (US);
Oscar Nestares, San Jose, CA (US);
INTEL CORPORATION, Santa Clara, CA (US);
Abstract
Techniques are provided for perception enhancement of light fields (LFs) for use in integral display applications. A methodology implementing the techniques according to an embodiment includes receiving one or more LF views and a disparity map associated with each LF view. The method also includes quantizing the disparity map into planes, where each plane is associated with a selected range of depth values. The method further includes slicing the LF view into layers, where each layer comprises pixels of the LF view associated with one of the planes. The method further includes shifting each of the layers in a lateral direction by an offset distance. The offset distance is based on a viewing angle associated with the LF view and further based on the depth values of the associated plane. The method also includes merging the shifted layers to generate a synthesized LF view with increased parallax.