The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2019

Filed:

Mar. 29, 2017
Applicant:

Massachusetts Institute of Technology, Cambridge, MA (US);

Inventors:

Bernard A. Alamariu, Newton, MA (US);

Omair I. Saadat, Cambridge, MA (US);

Tomas Apostol Palacios, Belmont, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 21/8238 (2006.01); H01L 21/8234 (2006.01); H01L 29/51 (2006.01); H01L 29/20 (2006.01); H01L 29/778 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28264 (2013.01); H01L 21/02164 (2013.01); H01L 21/02175 (2013.01); H01L 21/02238 (2013.01); H01L 21/02241 (2013.01); H01L 21/02255 (2013.01); H01L 21/823462 (2013.01); H01L 21/823857 (2013.01); H01L 29/2003 (2013.01); H01L 29/513 (2013.01); H01L 29/517 (2013.01); H01L 29/7786 (2013.01);
Abstract

A dielectric structure for a nitride semiconductor device and a method of forming the same. A semiconductor device includes at least one semiconductor layer. The at least one semiconductor layer includes a gallium nitride semiconductor material. The semiconductor device also includes an oxidized layer disposed over the at least one semiconductor layer. The oxidized layer includes an oxidized form of the gallium nitride semiconductor of the at least one semiconductor layer. A silicon oxide layer is disposed over the oxidized layer. A gate is disposed over the silicon oxide layer.


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