The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2019

Filed:

Jul. 03, 2014
Applicant:

Rigaku Corporation, Tokyo, JP;

Inventor:

Hisashi Konaka, Hamura, JP;

Assignee:

RIGAKU CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2018.01);
U.S. Cl.
CPC ...
G06F 19/701 (2013.01); C07B 2200/13 (2013.01);
Abstract

To provide a structure refining apparatus, a method and a program capable of univocally and appropriately setting a restraint with a statistically feasible intensity and specifying a crystal structure model making use of a measurement result under a constraint condition to reasonable known data. A structure refining apparatusadjusting the crystal structure model on the basis of the measurement result and the known data includes a restraint applying unitconfigured to apply the restraint such that a divergence between a parameter specifying a crystal structure and a known representative value becomes equivalent to a standard uncertainty of the known representative value and a structure specifying unitconfigured to specify the crystal structure model on the basis of the measurement result under the applied restraint.


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