The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2019
Filed:
Dec. 19, 2014
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Guangqing Chen, Fremont, CA (US);
Justin Ghan, Fremont, CA (US);
David Harold Whysong, Dublin, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5068 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/70641 (2013.01); G03F 7/70683 (2013.01); G03F 9/7046 (2013.01); G03F 9/7076 (2013.01);
Abstract
A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target.