The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2019
Filed:
Jun. 21, 2017
Nikon Corporation, Tokyo, JP;
Michael B. Binnard, Belmont, CA (US);
Daniel Gene Smith, Tucson, AZ (US);
David M. Williamson, Tucson, AZ (US);
NIKON CORPORATION, , JP;
Abstract
An extreme ultraviolet lithography system () that creates a pattern () having a plurality of densely packed parallel lines () on a workpiece () includes a patterning element (); an EUV illumination system () that directs an extreme ultraviolet beam (A) at the patterning element (); a projection optical assembly () that directs the extreme ultraviolet beam diffracted off of the patterning element () at the workpiece (); and a pattern blind assembly () positioned in a beam path () of the extreme ultraviolet beam (A). The pattern blind assembly () shapes the extreme ultraviolet beam (A) so that an exposure field () on the workpiece () has a polygonal shape.