The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Jan. 16, 2018
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventor:

Guowei Zhang, Singapore, SG;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66689 (2013.01); H01L 29/0623 (2013.01); H01L 29/7824 (2013.01);
Abstract

A high voltage (HV) transistor is integrated on a silicon-on-insulator (SOI) substrate. The HV transistor is disposed in a HV device region disposed on a bulk substrate of the SOI substrate. The HV device region includes a top field oxide which includes at least a part of a buried oxide (BOX) of the SOI substrate. A HV gate is disposed in HV region overlapping the HV top field oxide and includes first and second HV gate sidewalls. A drain is disposed on the bulk substrate and displaced from the first HV gate sidewall by the HV top field oxide. A source is disposed on the bulk substrate adjacent to the side of the second HV gate sidewall.


Find Patent Forward Citations

Zhang, Guowei. (2019). Extended drain transistor on a crystalline-on-insulator substrate (U.S. Patent No. 10283622). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10283622

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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