The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Nov. 27, 2012
Applicant:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Inventors:
Richard T. Schultz, Fort Collins, CO (US);
Omid Rowhani, King, CA;
Charles P. Tung, Westford, MA (US);
Assignee:
ADVANCED MICRO DEVICES, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 23/48 (2006.01); H01L 21/311 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
H01L 23/48 (2013.01); G03F 7/0035 (2013.01); G03F 7/70466 (2013.01); H01L 21/31144 (2013.01); H01L 2924/0002 (2013.01);
Abstract
Methods, a computer readable medium, and an apparatus are provided. A method includes and the computer readable medium is configured for decomposing an overall pattern into a first mask pattern that includes a power rail base pattern and into a second mask pattern, and generating on the second mask pattern a power rail insert pattern that is at least partially aligned with the power rail base pattern of the first mask pattern. The apparatus is produced by photolithography using photolithographic masks generated by the method.