The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2019

Filed:

Feb. 28, 2014
Applicant:

Shibaura Mechatronics Corporation, Yokohama-shi, JP;

Inventors:

Kunihiro Miyazaki, Yokohama, JP;

Konosuke Hayashi, Yokohama, JP;

Takashi Ootagaki, Yokohama, JP;

Yuji Nagashima, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 3/30 (2006.01); F26B 7/00 (2006.01); F26B 11/18 (2006.01); F26B 3/28 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); F26B 5/00 (2006.01);
U.S. Cl.
CPC ...
F26B 3/30 (2013.01); F26B 3/28 (2013.01); F26B 5/005 (2013.01); F26B 7/00 (2013.01); F26B 11/18 (2013.01); H01L 21/02057 (2013.01); H01L 21/67034 (2013.01); H01L 21/67115 (2013.01);
Abstract

According to one embodiment, a substrate processing apparatus () includes a table () configured to support a substrate W, a solvent supply unit () configured to supply a volatile solvent to a surface of the substrate W on the table (), and an irradiator () configured to emit light to the substrate W, which has been supplied with the volatile solvent, and function as a heater that heats the substrate W such that a gas layer is formed on the surface of the substrate W to make the volatile solvent into a liquid ball. Thus, it is possible to dry the substrate successfully as well as to suppress pattern collapse.


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