The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Sep. 18, 2017
Applicant:

Sensor Electronic Technology, Inc., Columbia, SC (US);

Inventors:

Remigijus Gaska, Columbia, SC (US);

Maxim S. Shatalov, Columbia, SC (US);

Alexander Dobrinsky, Silver Spring, MD (US);

Jinwei Yang, Columbia, SC (US);

Michael Shur, Latham, NY (US);

Grigory Simin, Columbia, SC (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/22 (2010.01); H01L 23/00 (2006.01); H01L 29/15 (2006.01); H01L 33/38 (2010.01); H01L 21/02 (2006.01); H01L 33/30 (2010.01); H01L 33/32 (2010.01);
U.S. Cl.
CPC ...
H01L 33/22 (2013.01); H01L 21/02496 (2013.01); H01L 24/05 (2013.01); H01L 24/14 (2013.01); H01L 29/151 (2013.01); H01L 33/30 (2013.01); H01L 33/32 (2013.01); H01L 33/38 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/06102 (2013.01); H01L 2224/1134 (2013.01); H01L 2924/12041 (2013.01); H01L 2924/12042 (2013.01); H01L 2933/0016 (2013.01);
Abstract

A device including a first semiconductor layer and a contact to the first semiconductor layer is disclosed. An interface between the first semiconductor layer and the contact includes a first roughness profile having a characteristic height and a characteristic width. The characteristic height can correspond to an average vertical distance between crests and adjacent valleys in the first roughness profile. The characteristic width can correspond to an average lateral distance between the crests and adjacent valleys in the first roughness profile.


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