High coupling ratio split gate memory cell

Abstract

A split gate non-volatile memory (NVM) cell formed on a crystalline-on-insulator (COI) substrate, such as a fully or partially depleted silicon-on-insulator (SOI) substrate is disclosed. The split gate memory cell includes a split gate disposed on a surface substrate of the SOI substrate between source/drain (S/D) regions. The split gate includes a storage gate with a control gate (CG) over a floating gate (FG), and a select gate (SG). A back gate is provided on the bulk substrate below a buried oxide (BOX). The back gate may be doped with the same polarity type dopants as the S/D regions. The back gate is coupled to the CG to increase CG coupling ratio, improving programming performance. Alternatively, the back gate may be doped with the opposite polarity type dopants as the S/D regions. The back gate is coupled to a negative bias during program and erase operations. The negative bias increases the gate threshold voltages of the SG and CG, resulting in higher electron generation efficiency to improve programming speed as well as a higher electric field to increase erase speed.