The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2019

Filed:

Sep. 29, 2016
Applicant:

Cadence Design Systems, Inc., San Jose, CA (US);

Inventors:

Wangyang Zhang, Allison Park, PA (US);

Shikha Sharma, Haridwar, IN;

Hongzhou Liu, Sewickley, PA (US);

Assignee:

CADENCE DESIGN SYSTEMS, INC., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/455 (2018.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5036 (2013.01); G06F 17/504 (2013.01); G06F 17/5081 (2013.01);
Abstract

Method for estimating a yield of a post-layout circuit design is provided. In one aspect, a method includes obtaining a first pre-layout parameter and a second pre-layout parameter from pre-layout simulation samples of a circuit. The method also modeling a prior distribution of a first post-layout parameter and a second post-layout parameter based on the first pre-layout parameter, the second pre-layout parameter, a first hyper-parameter, and second hyper-parameter. The method further includes calculating the first hyper-parameter and the second hyper-parameter using a cross-validation, obtaining the first post-layout parameter and the second post-layout parameter based on the first hyper-parameter and the second hyper-parameter and estimating the yield of the circuit design using a non-normal distribution parameterized by the obtained first post-layout parameter and second post-layout parameter.


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