The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Mar. 08, 2018
Asml Netherlands B.v., Veldhoven, NL;
Alexander Ypma, Veldhoven, NL;
Jasper Menger, Veldhoven, NL;
David Deckers, Veldhoven, NL;
David Han, Veldhoven, NL;
Adrianus Cornelis Matheus Koopman, Veldhoven, NL;
Irina Lyulina, Veldhoven, NL;
Scott Anderson Middlebrooks, Veldhoven, NL;
Richard Johannes Franciscus Van Haren, Veldhoven, NL;
Jochem Sebastiaan Wildenberg, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in said multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.