The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Oct. 16, 2015
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Schubert S. Chu, San Francisco, CA (US);

Kartik Shah, Sunnyvale, CA (US);

Anhthu Ngo, San Jose, CA (US);

Karthik Ramanathan, Bangalore, IN;

Nitin Pathak, Bangalore, IN;

Nyi O. Myo, San Jose, CA (US);

Paul Brillhart, Pleasanton, CA (US);

Richard O. Collins, Santa Clara, CA (US);

Kevin Joseph Bautista, San Jose, CA (US);

Edric Tong, Sunnyvale, CA (US);

Zhepeng Cong, Vancouver, WA (US);

Anzhong Chang, San Jose, CA (US);

Kin Pong Lo, Fremont, CA (US);

Manish Hemkar, Sunnyvale, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/67 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68735 (2013.01); C23C 16/4583 (2013.01); H01L 21/67115 (2013.01);
Abstract

Implementations of the present disclosure generally relate to a susceptor for thermal processing of semiconductor substrates. In one implementation, the susceptor includes a first rim surrounding and coupled to an inner region, and a second rim disposed between the inner rim and the first rim. The second rim includes an angled support surface having a plurality of cut-outs formed therein, and the angled support surface is inclined with respect to a top surface of the inner region.


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