The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2019
Filed:
Apr. 30, 2015
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 7/00 (2006.01); H01J 37/32 (2006.01); C25D 7/04 (2006.01); C25D 11/04 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32807 (2013.01); C25D 7/04 (2013.01); C25D 11/04 (2013.01); H01J 37/32449 (2013.01); H01J 37/32477 (2013.01); H01J 37/32513 (2013.01);
Abstract
A gas ring for a plasma system includes a gas ring body having a surface and an insulating protective layer covering the surface. Methods of manufacturing the gas ring are also provided.
Tsai, Wen-Pao. (2019). Gas ring for plasma system and method of manufacturing the same (U.S. Patent No. 10269544). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10269544
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile