The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Dec. 28, 2016
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Amar Patel, Kirkland, WA (US);

Peter-Pike J. Sloan, Bellevue, WA (US);

Craig C. Peeper, Kirland, WA (US);

Samuel Z. Glassenberg, Redmond, WA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/20 (2006.01);
U.S. Cl.
CPC ...
G06T 17/205 (2013.01); G06T 17/20 (2013.01); G06T 2210/36 (2013.01);
Abstract

Methods and computer-storage media are provided for rendering three-dimensional (3D) graphics by tessellating objects using novel structures and algorithms. Rendering utilizing 'patches,' configurable functions that include a specified number of control points, allows for computation on a per-patch or per-control-point basis, in addition to traditional per-vertex, per-primitive, and per-pixel methods. This produces a number of advantages over previous tessellation methods, including the reuse of computations across existing vertices and the ability to process at a lower frequency. The operations to compute points are simplified in order to optimize system resources used in the process. Transitions from un-tessellated to tessellated objects are smoother utilizing the present invention, while developers have more flexibility in the level of detail present at different edges of the same patch. Detail within a displacement map also can be increased without negative effects associated with previous systems and methods.


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