The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2019
Filed:
Jun. 14, 2016
Asml Netherlands B.v., Veldhoven, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Johannes Paul Marie De La Rosette, Venlo, NL;
Edwin Cornelis Kadijk, Eindhoven, NL;
Nicolas Alban Lallemant, Veldhoven, NL;
Jan Liefooghe, Knesselare, BE;
Markus Rolf Werner Matthes, Cologne, DE;
Marcel Johannus Elisabeth Hubertus Muitjens, Nuth, NL;
Hubert Matthieu Richard Steijns, Veldhoven, NL;
André Gillis Van De Velde, Veldhoven, NL;
Marinus Aart Van Den Brink, Moergestel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.