The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Jun. 14, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Jun Yamashita, Miyagi, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/30 (2006.01); B01F 3/02 (2006.01); C23C 16/44 (2006.01); B01F 5/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45514 (2013.01); B01F 3/02 (2013.01); B01F 3/026 (2013.01); B01F 5/0068 (2013.01); C23C 16/308 (2013.01); C23C 16/4412 (2013.01); C23C 16/45512 (2013.01); C23C 16/45531 (2013.01); C23C 16/45544 (2013.01); C23C 16/45565 (2013.01); B01F 2005/0014 (2013.01); B01F 2215/0096 (2013.01);
Abstract

A gas mixing device includes: a cylindrical portion including an upper surface which is closed; a gas outflow passage formed in a central portion of a bottom surface of the cylindrical portion, and extends downward; a plurality of gas stream guide walls disposed to be spaced apart from each other in a circumferential direction along an edge of an opening formed by the gas outflow passage in the bottom surface, and installed to be rotationally symmetrical to a center of the cylindrical portion, the gas stream guide walls protruding toward the upper surface; and a gas inlet part installed between the gas stream guide walls and an inner peripheral surface of the cylindrical portion, and into which a gas to be mixed flows.


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