The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Mar. 11, 2015
Applicant:

Lmt Lichtmesstechnik Gmbh Berlin, Berlin, DE;

Inventors:

Carsten Diem, Berlin, DE;

Thomas Reiners, Berlin, DE;

Dieter Sorowka, Berlin, DE;

Konstantin Radewald, Berlin, DE;

Peter Lange, Berlin, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/50 (2006.01); B25J 19/06 (2006.01); G01J 1/02 (2006.01); B25J 19/00 (2006.01); B25J 19/02 (2006.01); B25J 19/04 (2006.01); G05B 19/4061 (2006.01); G01J 1/42 (2006.01);
U.S. Cl.
CPC ...
B25J 19/063 (2013.01); B25J 19/0004 (2013.01); B25J 19/022 (2013.01); B25J 19/023 (2013.01); B25J 19/04 (2013.01); G01J 1/0242 (2013.01); G01J 3/504 (2013.01); G01J 3/505 (2013.01); G05B 19/4061 (2013.01); G01J 2001/4247 (2013.01); G01J 2001/4261 (2013.01);
Abstract

A method and a gonioradiometer for the direction-dependent measurement of at least one photometric or radiometric characteristic of an optical radiation source. The emission direction of the photometric or radiometric characteristic is described using a system of planes (A, B, C), the planes of which intersect at an intersection line which passes through the radiation centroid of the radiation source, and using an emission angle (α, β, γ) which specifies the emission direction (α, β, γ) within a considered plane. A sensor or the radiation source is fastened to a multi-axis articulated robot. The robot is configured to only swivel about precisely one of its axes during a measuring process, in which measurement values relating to different emission angles (α, β, γ) within a considered plane of the system of planes (A, B, C) or to different planes at a considered emission angle (α, β, γ) are detected.


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