The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2019

Filed:

Jun. 30, 2017
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

South China University of Technology, Guangzhou, Guangdong, CN;

Inventors:

Liangchen Yan, Beijing, CN;

Xiaoguang Xu, Beijing, CN;

Linfeng Lan, Beijing, CN;

Lei Wang, Beijing, CN;

Junbiao Peng, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/02 (2006.01); H01L 29/417 (2006.01); H01L 27/12 (2006.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0273 (2013.01); H01L 21/027 (2013.01); H01L 21/0212 (2013.01); H01L 21/0272 (2013.01); H01L 21/02107 (2013.01); H01L 21/02109 (2013.01); H01L 21/02112 (2013.01); H01L 21/02118 (2013.01); H01L 21/02642 (2013.01); H01L 21/28 (2013.01); H01L 27/124 (2013.01); H01L 27/1262 (2013.01); H01L 27/1292 (2013.01); H01L 29/41733 (2013.01); H01L 29/42384 (2013.01); H01L 29/66742 (2013.01); H01L 29/786 (2013.01); H01L 29/7869 (2013.01);
Abstract

The present application discloses a method of fabricating a plurality of electrodes. The method includes forming a hydrophobic pattern containing a hydrophobic material on a base substrate, the hydrophobic pattern has a first ridge on a first edge of the hydrophobic pattern, the hydrophobic pattern has a thickness at the first ridge greater than that in a region outside a region corresponding to the first ridge; removing a portion of the hydrophobic pattern outside the region corresponding to the first ridge; and forming a first electrode on a first side of the first ridge and a second electrode on a second side of the first ridge.


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