The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 2019

Filed:

Aug. 25, 2017
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Tomotaka Yamada, Kawasaki, JP;

Takashi Kamizono, Kawasaki, JP;

Yuki Fukumura, Kawasaki, JP;

Tatsuya Fujii, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); C08F 212/04 (2006.01); C08F 232/02 (2006.01); C08F 232/08 (2006.01); C08F 222/10 (2006.01); C08F 220/30 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08F 212/04 (2013.01); C08F 220/30 (2013.01); C08F 222/10 (2013.01); C08F 232/02 (2013.01); C08F 232/08 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2037 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid, including a base material including a copolymer having a structural unit represented by general formula (a9-1) or a structural unit represented by general formula (a9-2), 30 mol % or more of a structural unit represented by general formula (a10-1) and 45 mol % or more of a structural unit having an acid-decomposable group which increases a polarity under the action of an acid. In each formula, Rs is a hydrogen atom or the like; Yaand Yaare a single bond or a divalent linking group; Ris a hydrocarbon group having 1 to 20 carbon atoms or the like; Ris an oxygen atom or the like; j and nare integers of 1 to 3; Wais a (n+1)-valent aromatic hydrocarbon group.


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