The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2019

Filed:

Mar. 20, 2017
Applicant:

Nitto Denko Corporation, Osaka, JP;

Inventors:

Yuu Sugimoto, Osaka, JP;

Yoshito Fujimura, Osaka, JP;

Hiroyuki Tanabe, Osaka, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/02 (2006.01); H05K 1/05 (2006.01); H05K 3/06 (2006.01); H05K 3/46 (2006.01); H05K 3/00 (2006.01); H05K 3/10 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0284 (2013.01); H05K 1/0274 (2013.01); H05K 1/05 (2013.01); H05K 3/064 (2013.01); H05K 3/4644 (2013.01); H05K 3/4679 (2013.01); H05K 3/0008 (2013.01); H05K 3/06 (2013.01); H05K 3/108 (2013.01); H05K 2201/09227 (2013.01); H05K 2201/09272 (2013.01); H05K 2203/056 (2013.01); H05K 2203/0557 (2013.01); H05K 2203/0562 (2013.01);
Abstract

A method of producing a wired circuit board including an insulating layer and a conductive pattern, including: (1), an insulating layer having an inclination face, (2), a metal thin film provided at least on the inclination face, (3), a photoresist provided on the surface of the metal thin film, (4), a light shield portion of a photomask disposed so that a first portion, where the conductive pattern is to be provided in the photoresist, is shielded from light, and the photoresist is exposed to light through the photomask, (5), the first portion of the photoresist is removed to expose the metal thin film corresponding to the first portion, and (6), the conductive pattern is provided on the surface of the metal thin film exposed from the photoresist.


Find Patent Forward Citations

Loading…