The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Apr. 30, 2018
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Hans-Juergen Rostalski, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 17/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2008 (2013.01); G02B 17/0647 (2013.01); G02B 17/0652 (2013.01); G02B 17/0657 (2013.01); G03F 7/2004 (2013.01); G03F 7/7025 (2013.01); G03F 7/70233 (2013.01);
Abstract
An imaging optical unit for projection lithography has a plurality of mirrors for guiding imaging light from an object field in an object plane into an image field in an image plane along an imaging light beam path. At least two of the mirrors are embodied as GI mirrors. Exactly one stop serves to predefine at least one section of an outer marginal contour of a pupil of the imaging optical unit. The stop is arranged spatially in front of a penultimate mirror in the imaging light beam path. This results in an imaging optical unit that is well defined with regard to its pupil and is optimized for projection lithography.