The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Jun. 05, 2017
Asml Netherlands B.v., Veldhoven, NL;
Richard Quintanilha, Eindhoven, NL;
Nitish Kumar, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A metrology apparatus uses radiation () in an EUV waveband. A first detection system () includes a spectroscopic grating () and a detector () for capturing a spectrum of the EUV radiation after interaction with a target (T). Properties of the target are measured by analyzing the spectrum. The radiation () further includes radiation in other wavebands such as VUV, DUV, UV, visible and IR. A second detection system () is arranged to receive at least a portion of radiation () reflected by the first spectroscopic grating and to capture a spectrum (SA) in one or more of said other wavebands. The second waveband spectrum can be used to enhance accuracy of the measurement based on the EUV spectrum, and/or it can be used for a different measurement. Other types of detection, such as polarization can be used instead or in addition to spectroscopic gratings.