The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2019

Filed:

Dec. 28, 2017
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Frank Dieter Pfirsch, Munich, DE;

Franz-Josef Niedernostheide, Hagen am Teutoburger Wald, DE;

Hans-Joachim Schulze, Taufkirchen, DE;

Stephan Voss, Munich, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 29/739 (2006.01); H01L 29/15 (2006.01); H01L 29/08 (2006.01); H01L 29/861 (2006.01); H01L 29/06 (2006.01); H01L 29/16 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7395 (2013.01); H01L 29/0623 (2013.01); H01L 29/0634 (2013.01); H01L 29/083 (2013.01); H01L 29/157 (2013.01); H01L 29/7397 (2013.01); H01L 29/8611 (2013.01); H01L 29/0834 (2013.01); H01L 29/1608 (2013.01); H01L 29/2003 (2013.01);
Abstract

A superjunction bipolar transistor includes an active transistor cell area that includes active transistor cells electrically connected to a first load electrode at a front side of a semiconductor body. A superjunction area overlaps the active transistor cell area and includes a low-resistive region and a reservoir region outside of the low-resistive region. The low-resistive region includes a first superjunction structure with a first vertical extension with respect to a first surface at the front side of the semiconductor body. The reservoir region includes no superjunction structure such that the reservoir region includes the semiconductor body that extends from a region located at the first surface to a drain region.


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