The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Oct. 30, 2017
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Anirban Basu, Yorktown Heights, NY (US);
Guy M. Cohen, Yorktown Heights, NY (US);
Amlan Majumdar, Yorktown Heights, NY (US);
Yu Zhu, Yorktown Heights, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/205 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 21/762 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/205 (2013.01); H01L 21/762 (2013.01); H01L 29/66795 (2013.01); H01L 29/785 (2013.01); H01L 21/02241 (2013.01);
Abstract
A method includes providing a structure including a substrate, a buffer layer formed on the substrate and a semiconductor layer formed on the buffer layer, etching the semiconductor layer so as to form a fin and exposing the buffer layer, etching the buffer layer such that a portion of the buffer layer, disposed under the fin, is exposed, and oxidizing the buffer layer and fin so as to form an oxide layer under the fin.