The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 2019

Filed:

Sep. 30, 2016
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Lakshminarayana Pappu, Folsom, CA (US);

Kalyan C. Kolluru, Portland, OR (US);

Pete D. Vogt, Boulder, CO (US);

Christopher J. Nelson, Gilbert, AZ (US);

Amande B. Trang, Phoenix, AZ (US);

Uddalak Bhattacharya, Beaverton, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 5/06 (2006.01); H01L 25/065 (2006.01); H01L 25/18 (2006.01); G11C 5/02 (2006.01); G11C 29/02 (2006.01); G11C 29/12 (2006.01); G11C 29/48 (2006.01); G11C 29/00 (2006.01);
U.S. Cl.
CPC ...
H01L 25/0657 (2013.01); G11C 5/025 (2013.01); G11C 29/025 (2013.01); G11C 29/1201 (2013.01); G11C 29/48 (2013.01); G11C 29/702 (2013.01); H01L 25/18 (2013.01); H01L 2225/06527 (2013.01); H01L 2225/06544 (2013.01); H01L 2225/06555 (2013.01);
Abstract

Systems, methods, and apparatuses for implementing die recovery in Two-Level Memory (2LM) stacked die subsystems are described. A stacked semiconductor package includes a processor functional silicon die at a first layer of the stacked semiconductor package; one or more memory dies forming a corresponding one or more memory layers of the stacked semiconductor package; a plurality of Through Silicon Vias (TSV s) formed through the one or more memory dies; a plurality of physical memory interfaces electrically interfacing the one or more memory dies to the processor functional silicon die at the first layer through the memory layers via the plurality of TSVs; and a redundant physical memory interface formed by a redundant TSV traversing through the memory layers to the processor functional silicon die at the first layer through which to reroute a memory signal path from a defective physical memory interface at a defective TSV to a functional signal path traversing the redundant TSV.


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