The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Apr. 25, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Zihui Li, Santa Clara, CA (US);
Xing Zhong, Foster City, CA (US);
Anchuan Wang, San Jose, CA (US);
Nitin K. Ingle, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01J 37/32 (2006.01); H01L 21/3213 (2006.01); C30B 33/12 (2006.01); C09K 13/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); C30B 33/12 (2013.01); H01J 37/32165 (2013.01); H01J 37/32183 (2013.01); H01J 37/32357 (2013.01); H01J 37/32449 (2013.01); H01L 21/32137 (2013.01); C09K 13/06 (2013.01);
Abstract
The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.